JPS6153428B2 - - Google Patents
Info
- Publication number
- JPS6153428B2 JPS6153428B2 JP57178763A JP17876382A JPS6153428B2 JP S6153428 B2 JPS6153428 B2 JP S6153428B2 JP 57178763 A JP57178763 A JP 57178763A JP 17876382 A JP17876382 A JP 17876382A JP S6153428 B2 JPS6153428 B2 JP S6153428B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- rod
- rods
- electrode holding
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004020 conductor Substances 0.000 claims description 24
- 230000002265 prevention Effects 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 9
- 239000012808 vapor phase Substances 0.000 claims description 6
- 239000012212 insulator Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57178763A JPS5969141A (ja) | 1982-10-12 | 1982-10-12 | 外熱形プラズマ化学気相生成装置の電極保持装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57178763A JPS5969141A (ja) | 1982-10-12 | 1982-10-12 | 外熱形プラズマ化学気相生成装置の電極保持装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5969141A JPS5969141A (ja) | 1984-04-19 |
JPS6153428B2 true JPS6153428B2 (en]) | 1986-11-18 |
Family
ID=16054177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57178763A Granted JPS5969141A (ja) | 1982-10-12 | 1982-10-12 | 外熱形プラズマ化学気相生成装置の電極保持装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5969141A (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6227928U (en]) * | 1985-08-01 | 1987-02-20 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6299476A (ja) * | 1985-10-28 | 1987-05-08 | Agency Of Ind Science & Technol | プラズマcvd装置の放電電極 |
-
1982
- 1982-10-12 JP JP57178763A patent/JPS5969141A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6227928U (en]) * | 1985-08-01 | 1987-02-20 |
Also Published As
Publication number | Publication date |
---|---|
JPS5969141A (ja) | 1984-04-19 |
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